Process Engineering Intern - Ru0026D Plasma Etch Jan - Aug 2021

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:text,ActualValueFromSolar:null},{QuestionName:Job Description,AnswerValue:u003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eu003cspan style=color: rgb(34, 34, 34);\u003eThe brightest of the bright. Our scientists at TEL Technology Center, America, LLC. work to integrate new and innovative technology into the products and tools we currently have as well as develop new tools to streamline our current processes. We are a representation of TELu0027s world class technology enabling us to move to the forefront of todayu0027s marketplace. Utilizing original development strategies and processes has fully equipped us with the capability to provide unparalleled service systems that have been utilized on a global scale. u003c/spanu003eu003c/fontu003eu003c/fontu003eu003cbru003eu0026nbsp;u003cbru003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eu003cspan style=color: rgb(34, 34, 34);\u003e*This position is payrolled via payroll processing provider.u003c/spanu003eu003c/fontu003eu003c/fontu003eu003cbru003eu0026nbsp;u003cbru003eu003cstrongu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003ePosition Summary:u003c/fontu003eu003c/fontu003eu003c/strongu003eu003cbru003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eAs a research and development Process Engineering Intern at the TEL Technology Center, America (TTCA) you will work to integrate new and innovative technology into the products and tools we currently have as well as develop new tools to streamline our current processes. We are a representation of TEL’s world-class technology, enabling us to move to the forefront of today’s marketplace. The successful candidate will investigate, using analytical plasma and surface diagnostic equipment, plasma-surface interactions for advanced etching processes. u003c/fontu003eu003c/fontu003eu003cbru003eu0026nbsp;u003cbru003eu003cstrongu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eu003cspan style=color: black;\u003eResponsibilities: u003c/spanu003eu003c/fontu003eu003c/fontu003eu003c/strongu003eu003cbru003eu0026nbsp;u003cul dir=ltr\u003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eOperation of semiconductor process and metrology equipment, data collection, and the review of processing techniques and methods applied in the manufacture, fabrication, and evaluation of semiconductors.u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eDevelopment of new processes and interpretation of plasma-chemicals mechanisms and reactionsu003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eDevelopment of new data collection methods and analytical equipmentu003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eOperation of TEL plasma processing equipment including various etch and deposition process toolsu003c/fontu003eu003c/fontu003eu003c/liu003eu003c/ulu003eu0026nbsp;u003cbru003eu003cstrongu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eQualifications: u003c/fontu003eu003c/fontu003eu003c/strongu003eu003cbru003eu0026nbsp;u003cul dir=ltr\u003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003ePursuing a BS, MS or PhD degree in an engineering discipline (certain science disciplines also acceptable, e.g. Chemistry, Physics).u003c/fontu003eu003c/fontu003eu003c/liu003eu003c/ulu003eu003cul dir=ltr\u003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eMust be legally authorized to work in the U.S without sponsorship.u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eBasic semiconductor processing fundamentals or experience. u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eExperience in clean room environment. u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003ePractical experience in design and operation of high vacuum equipment and pulse/RF power circuits is a plusu003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eThe flexibility and ability to work both independently with limited supervision as well as part of a team. u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eIndividual must have excellent verbal and written communication skills including presentations given for small to large groups.u003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eMust be fluent in Englishu003c/fontu003eu003c/fontu003eu003c/liu003eu003cliu003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eDemonstrated problem solving skills are preferred.u003c/fontu003eu003c/fontu003eu003c/liu003eu003c/ulu003eu0026nbsp;u003cbru003eu003cfont style=font-size: 10pt;\u003eu003cfont style=font-family: arial,sans-serif; size: undefined;\u003eEqual Opportunity Employer/Minorities/Females/Disabled/Veteransu003c/fontu003eu003c/fontu003eu003cbru003eu0026nbsp;,VerityZone:jobdescription,QuestionType:textarea,ActualValueFromSolar:null},{QuestionName:State/Province,AnswerValue:NY,VerityZone:formtext3,QuestionType:single-select,ActualValueFromSolar:null},{QuestionName:City,AnswerValue:Albany,VerityZone:formtext4,QuestionType:single-select,ActualValueFromSolar:null},{QuestionName:Subsidiary,AnswerValue:TEL Technology Center, America, Inc. ,VerityZone:formtext5,QuestionType:single-select,ActualValueFromSolar:null}],GQId:1990,isGQResponsive:true,isActive:true,isSocialReferralJobRestricted:false,localeId:1033,AutoOptionalReqId:7052BR,Title:Process Engineering Intern - Ru0026D Plasma Etch (Jan - Aug 2021),JobSiteId:5075,Link:****{Responsive_AdvancedCSS: /*#N#GUIDELINES#N##N#• Enter CSS here.#N##N#• Please take care not to compromise accessibility including color contrast.#N##N#• Please test all window widths so that all responsive break-points remain in tact.#N##N#• Please refer to attributes of the body tag to limit the scope of your rules to a single workflow, or else be sure to check each individual workflow.#N#*/#N##N#.pageHeaderContainer a {#N##T#outline:0;#N#}#N#.primaryButton {#N##T#color:#fff !important;#N#}#N#@media screen and (min-width:769px) {#N##T#div.pageHeaderContainer {#N##T##T#width:100%;#N##T##T#margin-bottom:30px;#N##T##T#border-bottom-style:solid;border-bottom-width:1px;border-color:#E2E2E2;#N##T#}#N##T#div.pageHeader {#N##T##T#border-bottom-style:solid;border-bottom-width:1px;border-color:#E2E2E2;#N##T#}#N##T##headerLinkContainer {#N##T##T#white-space:nowrap;#N##T##T#margin:0 auto 0px auto; 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